EUV lithography (EUVL) PPT and PDF Report: EUV lithography (EUVL) is one of the cardinal NGL technologies; others include x-ray lithography, ion-beam projection lithography, and electron-beam projection lithography.

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EUV lithography (EUVL) Seminar and PPT with PDF Report

EUVL Advantages

  • Microprocessors made by euvl are up to to 100 times faster than today’s most powerful chips
  • Decrease in size of chip but the speed increases.
  • EUVL technology attains good profundity of focus and linearity for both dense and isolated lines with low NA.
  • Increase in storage capacity.
  • The low thermal expansion substrates provide good image placement.

EUVL Disadvantages

  • Positive charging, due to ejection of photoelectrons
  • Contamination deposition on the resist from out gassed haydrocarbons, which results from EUV- or electron-driven reactions.
  • No known method for repairing defects in a ML coating.
  • Entire process has to be carried out in vacuum.
  • Mirrors used are only 70% reflective.

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Conclusion

  • EUVL will open a new segment in semiconductor technology.
  • Successful implementation of EUVL would enable projection lithography to remain semiconductor industry’s pattern technology of choice for years to come.
  • Much work is to be done in order to regulate whether EUVL is ready for huge scale production.

Content of the Seminar and pdf report for EUV lithography (EUVL)

  • Lithography
  • Introduction to EUVL
  • Basic concepts
  • Why do we need EUVL?
  • EUVL Process
  • Basic technology for EUV
  • EUV masks
  • All Reflective Optics
  • Advantages
  • Disadvantages
  • Conclusion
  • References

Here we have provided you EUV lithography (EUVL) Seminar and PPT with PDF report. All you need to do is just click on the download link and get it.

EUV lithography (EUVL) PPT and Seminar Free Download

EUV lithography (EUVL) pdf Report Free Download

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